Electrostatic chuck with improved spacing and charge migration reduction mask



FIG. 1 is a top view of the electrostatic chuck having the improved spacing and charge migration reduction mask;

FIG. 2 is an elevation view when looking to the right along the x-axis in FIG. 1 , the view when looking to the left along the x-axis in FIG. 1 being identical to that of FIG. 2 thereof;

FIG. 3 is a detailed view of part of the surface seen in FIG. 2 thereof;

FIG. 4 is a bottom view thereof;

FIG. 5 is an elevation view when looking down along the y-axis in FIG. 1 thereof; and,

FIG.6 is an elevation view when looking up along the y-axis in FIG. 1 thereof. 

The ornamental design for an electrostatic chuck with improved spacing and charge migration reduction mask, as shown and described. 